| Deep learning model in high-mix semiconductor manufacturing |
2022-9-23 |
2023-3-30 |
|
| Substrate mapping using deep neural-networks |
2022-9-15 |
2023-3-23 |
|
| High resolution multispectral multi-field-of-view imaging system for wafer … |
2022-9-08 |
2023-3-16 |
|
| High resolution multi-field-of-view imaging system |
2022-8-17 |
2023-2-23 |
|
| Multiple camera apparatus for photolithographic processing |
2022-8-01 |
2023-2-09 |
|
| Low contrast non-referential defect detection |
2022-7-18 |
2023-1-26 |
|
| Effective cell approximation model for logic structures |
2022-5-04 |
2022-11-14 |
|
| Fabrication fingerprint for proactive yield management |
2022-4-20 |
2022-10-20 |
|
| Opto acousto-optic measurements of transmissive film laminate |
2022-3-30 |
2022-10-13 |
|
| Multi-layer calibration for empirical overlay measurement |
2022-3-30 |
2022-10-06 |
|
| Post-overlay compensation on large-field packaging |
2022-3-01 |
2022-9-09 |
|
| A system and method for performing alignment and overlay measurement through an … |
2021-11-23 |
2022-8-01 |
|
| Focus system for optical metrology device |
2021-11-03 |
2022-6-09 |
|
| Vortex polarimeter |
2021-11-03 |
2022-9-16 |
|
| System and method for optimizing a lithography exposure process |
2021-8-20 |
2022-3-10 |
|
| Calibration of azimuth angle for optical metrology stage using grating-coupled … |
2021-8-13 |
2022-3-16 |
|
| Target for optical measurement of trenches |
2021-4-16 |
2022-5-05 |
|
| Characterization of patterned structures using acoustic metrology |
2021-3-30 |
2021-10-21 |
|
| System and method for correcting overlay errors in a lithographic process |
2021-2-19 |
2021-8-26 |
|
| Fast generalized multi-wavelength ellipsometer |
2021-1-21 |
2021-8-26 |
|
| Beamsplitter-based ellipsometer focus system |
2020-9-29 |
2022-4-28 |
|
| Apparatuses and methods for interferometric defect inspection |
2020-9-15 |
2022-5-01 |
2022-5-01 |
| Non-destructive inspection and manufacturing metrology systems and methods |
2020-5-22 |
2021-12-23 |
|
| Active damper for semiconductor metrology and inspection systems |
2020-5-18 |
2020-12-03 |
|
| Optical metrology device using numerical aperture reduction |
2020-5-15 |
2021-2-16 |
|
| Enhanced heat transfer in liquefied gas cooled detector |
2020-4-03 |
2021-10-07 |
|
| Optical metrology device for measuring samples having thin or thick films |
2019-11-25 |
2021-5-21 |
2021-5-21 |
| Local purge within metrology and inspection systems |
2019-9-16 |
2020-1-09 |
|
| On-axis dynamic interferometer and optical imaging systems employing the same |
2019-7-11 |
2022-3-01 |
2022-3-01 |
| Method and apparatus of characterizing a test sample that is a semiconductor … |
2019-6-24 |
2020-11-11 |
2020-11-11 |
| Correction of angular error of plane-of-incidence azimuth of optical metrology … |
2019-5-20 |
2019-9-05 |
|
| Optical metrology system using infrared wavelengths |
2019-3-13 |
2021-1-26 |
2021-1-26 |
| Interferometry with pixelated color discriminating elements combined with … |
2019-2-01 |
2022-6-07 |
2022-6-07 |
| Separated axis lithographic tool |
2018-12-26 |
2020-10-22 |
|
| Interferometer with pixelated phase shift mask and method of performing an … |
2018-12-21 |
2021-4-01 |
2021-4-01 |
| Conformal stage |
2018-12-21 |
2020-12-24 |
|
| Method and apparatus of detecting a sub-resolution defect on a sample |
2018-11-30 |
2021-11-11 |
2021-11-11 |
| Sample inspection using topography |
2018-11-21 |
2021-3-02 |
2021-3-02 |
| Laser triangulation sensor system and method for wafer inspection |
2018-11-06 |
2020-11-12 |
|
| Wafer-level package assembly handling |
2018-9-28 |
2022-4-21 |
|
| High resolution stage positioner |
2018-9-13 |
2020-9-10 |
|
| FOUP purge shield |
2018-7-27 |
2020-9-22 |
2020-9-22 |
| Wafer inspection system including a laser triangulation sensor |
2018-6-08 |
2020-6-18 |
|
| Deconvolution to reduce the effective spot size of a spectroscopic optical … |
2018-4-30 |
2019-4-30 |
2019-4-30 |
| Inspection of substrates |
2018-3-22 |
2020-2-04 |
2020-2-04 |
| Non-adhesive mounting assembly for a tall rochon polarizer |
2018-3-02 |
2018-9-13 |
|
| Focusing system with filter for open or closed loop control |
2018-2-26 |
2018-9-06 |
|
| Substrate handling and identification mechanism |
2017-12-21 |
2018-6-21 |
|
| System and method of characterizing micro-fabrication processes |
2017-5-22 |
2017-9-07 |
|
| Wafer singulation process control |
2016-12-27 |
2020-12-11 |
2020-12-11 |
| Scanning white-light interferometry system for characterization of patterned … |
2016-12-22 |
2019-5-14 |
2019-5-14 |
| Single-step interferometric radius-of-curvature measurements utilizing short- … |
2016-12-20 |
2018-1-02 |
2018-1-02 |
| Opto-acoustic metrology of signal attenuating structures |
2016-11-08 |
2019-2-19 |
2019-2-19 |
| Single snap-shot fringe projection system |
2016-8-03 |
2018-5-01 |
2018-5-01 |
| 3d target for monitoring multiple patterning process |
2016-7-22 |
2017-2-02 |
|
| Focus adjustment for surface part inspection |
2016-7-13 |
2019-9-10 |
2019-9-10 |
| Interferometric characterization of surface topography |
2016-7-11 |
2017-1-19 |
|
| Optical metrology system for spectral imaging of a sample |
2016-6-09 |
2016-10-06 |
|
| System for directly measuring the depth of a high aspect ratio etched feature … |
2016-4-29 |
2016-8-18 |
|
| High-resolution in-line metrology for roll-to-roll processing operations |
2016-2-21 |
2017-8-29 |
2017-8-29 |
| Method and apparatus to assist the processing of deformed substrates |
2015-11-18 |
2018-7-03 |
2018-7-03 |
| Calibration of semiconductor metrology systems |
2015-10-13 |
2019-1-08 |
2019-1-08 |
| Non-destructive acoustic metrology for void detection |
2015-9-29 |
2017-8-03 |
|
| Optical critical dimension target design |
2015-7-24 |
2017-11-21 |
2017-11-21 |
| Optical metrology with purged reference chip |
2015-7-24 |
2016-2-04 |
|
| Protected lens cover plate for an optical metrology device |
2015-7-24 |
2016-2-04 |
|
| Optical metrology using differential fitting |
2015-5-22 |
2018-6-12 |
2018-6-12 |
| Simultaneous measurement of multiple overlay errors using diffraction based … |
2015-4-13 |
2015-10-29 |
|
| Via characterization for bcd and depth metrology |
2014-12-15 |
2015-6-18 |
|
| Method of measuring and assessing a probe card with an inspection device |
2014-6-06 |
2017-6-20 |
2017-6-20 |
| Inspection device with vertically moveable assembly |
2014-5-20 |
2014-9-11 |
|
| Substrate handler |
2014-4-15 |
2014-10-23 |
|
| Assessing alignment of top and bottom ends of TSVs and characterizing … |
2014-1-23 |
2018-4-24 |
2018-4-24 |
| Edge grip substrate handler |
2013-12-20 |
2015-12-24 |
|
| Optical metrology with multiple angles of incidence and/or azimuth angles |
2013-12-04 |
2015-8-25 |
2015-8-25 |
| Optical metrology system for spectral imaging of a sample |
2013-11-26 |
2015-11-10 |
2015-11-10 |
| Ellipsometer focusing system |
2013-10-04 |
2016-1-26 |
2016-1-26 |
| Inspection of substrates using calibration and imaging |
2013-9-27 |
2015-9-10 |
|
| Planar motor system with increased efficiency |
2013-9-27 |
2017-4-18 |
2017-4-18 |
| Flying sensor head |
2013-6-27 |
2015-11-12 |
|
| Probe card analysis system and method |
2013-6-18 |
2014-1-23 |
|
| Wafer edge inspection illumination system |
2013-4-23 |
2015-6-23 |
2015-6-23 |
| Image based overlay measurement with finite gratings |
2013-2-13 |
2013-8-15 |
|
| Wafer inversion mechanism |
2012-12-21 |
2013-8-15 |
|
| On-axis focus sensor and method |
2012-12-20 |
2014-12-18 |
|
| Selective overtravel during electrical test of probe cards |
2012-10-09 |
2014-2-25 |
2014-2-25 |
| Measurement of a sample using multiple models |
2012-7-26 |
2013-8-06 |
2013-8-06 |
| Apparatus and method for electrical characterization by selecting and adjusting … |
2012-7-03 |
2015-8-18 |
2015-8-18 |
| Wafer edge inspection and metrology |
2012-5-08 |
2014-8-26 |
2014-8-26 |
| Dark field diffraction based overlay |
2012-4-24 |
2014-8-26 |
2014-8-26 |
| Multiple measurement techniques including focused beam scatterometry for … |
2012-3-19 |
2012-10-25 |
|
| Position sensitive detection optimization |
2012-1-27 |
2015-9-22 |
2015-9-22 |
| In-Plane Optical Metrology |
2011-10-27 |
2012-2-16 |
|
| Support for semiconductor substrate |
2011-9-26 |
2016-7-26 |
2016-7-26 |
| Focusing method and apparatus |
2011-7-11 |
2012-6-19 |
2012-6-19 |
| Scratch detection method and apparatus |
2011-6-30 |
2013-8-22 |
|
| Thin films and surface topography measurement using reduced library |
2011-5-20 |
2014-8-26 |
2014-8-26 |
| Local Stress Measurement |
2011-4-25 |
2011-11-03 |
|
| Wafer shape thickness and trench measurement |
2011-4-08 |
2012-10-11 |
|
| Scanning focal length metrology |
2011-3-29 |
2012-9-04 |
2012-9-04 |